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Rf Plasma Treatment
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Pieces
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Origin
China Mainland
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Description of rf plasma treatment
Machine Model: Plasma Processing Equipment
rf plasma treatment Model: PR80L
Equipment weight: about 280KG
Rated power: 3KW
Equipment power supply: AC-380V/three-phase five-wire
rf plasma treatment specification: 920mm(W)×1030mm(D)×1720mm(H)
Vacuum chamber specifications: 450mm (W) × 450mm (D) × 400mm (H) can be customized according to product
Electrode plate specifications: 430mm (W) × 360mm (D), 8 layers, plate spacing: 41mm, can be any combination
Single layer treatment of the largest area: 390mm (W) × 345mm (D)
Bracket mode: custom aluminum bracket structure
Capacity: According to product specifications
Processing time: different process, different processing time
Plasma generator power: RF 13.56MH z, 0-500W adjustable
Vacuum Pump System: Mechanical Vacuum Pump
Vacuum Measurement System: Aifa High Precision Vacuum Gauge
Working vacuum degree: 20-60Pa
Vacuum pump limit pressure: 4.0×10-1Pa
Vacuum time: =60S
Breaking vacuum time: 20-60S
Gas supply method: solenoid valve type
Flowmeter adjustment range: 0-300Sccm (ml/min)
Input air pressure monitoring system: 2 air pressure decompression tables, 2 gas mass flow meters
Operation method: manually take and place the workpiece, start automatic control with a key
Uses: Different combinations for different process manufacturing, can be used to connect devices, metal-based workpieces, ceramics, glass and other workpiece surface cleaning, activation and so on.
Company of rf plasma treatment
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