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Rie Etching
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Min Order
1
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Product Unit
Pieces
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Origin
China Mainland
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Product Detail
Description of rie etching:
Equipment Name: Plasma Processing Equipment
rie etching Model:RYC-1000
Machine weight: about 650KG
Rated power: 8KW
Machine power supply: AC-380V/three-phase five-wire
Specifications of rie etching: 1200mm(W)×1300mm(D)×1740mm(H) Industrial Compact
Vacuum chamber specifications: 695mm (W) × 595mm (D) × 550mm (H) imported aluminum
Electrode plate specifications: 450mm (W) × 500mm (D), 11 layers of vertical electrode plates, processing 10 layers
Bracket way: fixed oblique product bracket: 16/layer
Capacity: 160 pieces/time
Processing time: different process, different processing time
Plasma generator power: RF generator + original matcher 0-1000W adjustable
Vacuum Pump System: Mechanical Oil Rotary Vacuum Pump + Roots Pump
Vacuum Measurement System: Pirani Vacuum Gauge
Working vacuum degree: 20-60Pa
Vacuum pump limit pressure: 4.0×10-1Pa
Vacuum time: =100S
Breaking vacuum time: =60S
Vacuum breaking system: dedicated GDQ
Gas supply method: solenoid valve type (3 ways, one way anticorrosion)
Flowmeter adjustment range: 0-500Sccm (ml/min)
Monomer gas circuit: It is connected to the chamber separately and automatically controlled by a grafting device.
Operation method: manually take and place the workpiece, start automatic control with a key
Using of rie etching:
The treatment of various types of medical devices, increase the surface energy, increase the attachment, supporting the special grafting equipment into different monomers, to achieve the surface grafting and other products.
Company of rie etching:
Package of rie etching:
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